15min:
LASER SPECTROSCOPIC STUDY OF THE SiAr VAN DER WAALS COMPLEX.

CHONG TAO, ALEXEY TESLJA AND PAUL J. DAGDIGIAN, Department of Chemistry, The Johns Hopkins University, Baltimore, Md 21218-2685; SULE ATAHAN AND MILLARD H. ALEXANDER, Department of Chemistry and Biochemistry, The University of Maryland, College Park, MD 20742-2021.

Laser fluorescence excitation spectra of the SiAr van der Waals complex, in the vicinity of the Si 3Do leftarrow 3P atomic resonance transition near 220.7 nm are reported. At low resolution, a single excited state (v',0) progression of bands terminating in a dissociation continuum is observed. Several weaker bands associated with many of these strong bands are found in scans at higher resolution. A transition to an excited 3 Sigma- state which correlates with the excited Si(3Do)+Ar asymptote was assigned, and a rotational and vibrational analysis of the observed bands was carried out. The dissociation energies of the Omega=0+ components of the ground X 3 Sigma- and excited 3 Sigma- states were determined [D0'' = 178.8 \pm 0.4 and D0' = 122.5\pm0.4 cm-1]. Ab initio calculations of the SiAr X 3 Sigma- and A 3 Pi electronic states correlating with the ground-state Si(3s23p2 3P) + Ar asymptote were also carried out. The potential energy curves of the definite- Omega states were computed and used to estimate the dissociation energy, rotational constant, and phenomenological spin-spin interaction in the X 3 Sigma- state. These parameters were found to be in resonable agreement with the experimental determinations.