FD01 |
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GERT VON HELDEN, DENIZ VAN HEIJNSBERGEN, GERARD MEIJER, FOM Institute for Plasma Physics Rijnhuizen, Edisonbaan 14, NL-3430 BE Nieuwegein, The Netherlands, http://www.rijnh.nl; MICHAEL A. DUNCAN, Department of Chemistry, University of Georgia,
Athens, Georgia 30602, U.S.A., http://www.chem.uga.edu.
FD02 |
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OWEN C. THOMAS, WEIJUN ZHENG SHOUJUN XU AND KIT H. BOWEN, Department of Chemistry, Johns Hopkins University, Baltimore, MD, 21218.
FD03 |
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E. BENICHOU, E. LANGLOIS AND B. SIMARD, Steacie Institute for Molecular Sciences, National Research Council of Canada, 100 Sussex Drive, Ottawa, Ontario, K1A 0R6, Canada; A. MARTINEZ, Departamento de Quimica, Division de Ciencias Basicas e Ingeniera, Universidad Autonoma Metropolitana - Iztapala, A.P. 55-534,Mexico, 09340 Mexico .
FD04 |
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GRETCHEN K. ROTHSCHOPF, SHENGGANG LI, JIMMYE SHANNON PERKINS AND DONG-SHENG YANG, Department of Chemistry, University of Kentucky, Lexington, KY 40506-0055.
FD05 |
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GRETCHEN K. ROTHSCHOPF, JIMMYE SHANNON PERKINS, SHENGGANG LI AND DONG-SHENG YANG, Department of Chemistry, University of Kentucky, Lexington, KY 40506-0055; JUN MIYAWAKI, National Institute of Materials and Chemical Research, National Institute for Advanced Interdisciplinary Research, Higashi, Tsukuba, Ibaraki 305, Japan.